Philippe Leray

Philippe Leray joined imec in 2001, after being metrology group leader in imec until May 2018, he became the director of advanced patterning, then Vice President R&D of Angstrom Patterning Development in 2025. This department is composed of 150 experts in advanced lithography, imaging, materials, OPC, in-line metrology and inspection development for imec advanced nodes (CFET, High NA, backside patterning, 3DDRAM, etc...).