Carlo Luijten - ASML

Abstract: High NA EUV introduction – the more sustainable choice?
Lithography continues to underpin semiconductor manufacturing by imaging increasingly small features as IC technologies become more complex. This improved resolution is achieved by introducing generations of lithography tools with ever smaller wavelengths and larger numerical apertures. The power of 13.5nm EUV light has been demonstrated in manufacturing since the 7nm logic node. Now, engineering advances support a new, high NA, EUV scanner. Designed for capability, it also uses more power than the lower NA option. This paper will introduce the ASML EXE high NA tool and describe a simple patterning example to quantify the emissions impact associated with its introduction. The more general question of which conditions consume the least amount of power will be addressed to inform sustainable integration decisions.