Every monolayer matters

The semiconductor industry is on a trajectory to reach a $1T market size by end of this decade, driven by the surging demand for artificial intelligence, high-performance computing, data storage, 6G, autonomous driving and electric vehicles. This growth is underpinned by well-established roadmaps for compute and storage technologies, which highlight the transition of logic and memory devices to vertical 3D architectures and continued scaling enabled by new materials and deposition technologies.

Atomic Layer Deposition (ALD) and epitaxial growth (Epi) processes play a pivotal role in these advanced technology nodes. ALD’s ability to deposit layers one atom at a time ensures that every monolayer contributes to the overall performance and reliability of semiconductor devices. Similarly, Epi involves the deposition of crystalline layers on a substrate. It allows for the integration of new materials that can enhance device performance and enable further scaling.

As technologies become more complex and miniaturized, each monolayer contributes to the device’s overall structure, performance, and reliability. As such, the monolayer level control and precision offered by ALD and Epi processes become indispensable. This presentation will share a few such examples, where ALD and Epi are enabling cutting-edge technologies.