Sara Paolillo

Sara Paolillo is a Dry Etch R&D Engineer at imec, focusing on advanced patterning for next‑generation semiconductor technology nodes. She works within imec’s dry etching team, where she develops and optimizes etch processes for wafers exposed with EUV lithography. Sara received her master’s degree in physics engineering from Politecnico di Milano in 2009. She has been active in the dry etch field since 2010, beginning her career as a dry etch R&D engineer at STMicroelectronics. In 2015, she joined imec in Belgium, where she continues to focus on cutting‑edge dry etch process development within the advanced patterning program.