High NA EUV adoption: The next step in lithography leadership

14:25 - 14:40

Abstract

EUV lithography is a foundational enabling semiconductor scaling technology that provides Europe with strategic leverage in an increasingly competitive global landscape, as AI drives the next industrial revolution and fuels exponential growth in the semiconductor industry. Advancing the lithography roadmap towards High NA EUV requires a holistic patterning approach to address High NA specific pivots. Imec is home to the world’s strongest patterning ecosystem and is therefore uniquely positioned to enable the key drivers of High NA EUV lithography, including resolution scaling, process simplification, and new design constructs. This will secure the lithography roadmap and Europe’s continued leadership in lithography.